Layer deposition techniques have emerged as indispensable methods for constructing ultrathin films with precise control over thickness, composition and microstructure. Methods such as atomic layer ...

Thin films play a crucial role in the fabrication of several components and devices, such as protective coatings, integrated circuits, solar cells, and optical ...

Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

Discover how KDF is balancing legacy expertise with forward-looking innovation to shape the future of thin-film deposition. KDF has been a trusted name in thin-film deposition for decades. How would ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

The laser wavelength, pulse duration, and fluence (energy density) significantly influence the ablation process and the resulting plasma plume. Shorter wavelengths and higher fluences generally lead ...

A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, has made a ...

A new material provides high-performance conversion of heat into electricity, offering a way to make electronic devices more ...